.Photolithography Process Simulation for Integrated Circuitsand Microelectromechanical Syste.pdfVIP

第 27 卷 　第 4 期 半 　导 　体 　学 　报 Vol . 27 　No . 4 2006 年 4 月 C H IN ES E J O U RN AL O F S EM I CON D U C TO RS Ap r . ,2006 Photol ithography Process Simulation f or Integrated Circuits and Microelectromechanical System Fabrication Zhou Zaifa , Huang Qin g ’an , an d Li Weihua ( ) Key L aboratory of M EM S of t he M i nis t ry of E d ucat ion , S out heas t Uni vers ity , N anj i ng 　2 10096 , Chi na Abstract : Si mulat i ons of p h ot or esist et chin g , aeri al i m age , exp osur e , an d p ostba k e p r ocesses ar e int egr at e d t o ob t ain a p h ot olit h ogr ap h y p r ocess si mulat i on f or micr oelect r om ech a nical syst e m ( M EMS) an d int egr at e d cir cuit ( I C) f ab ricat i on base d on t h r eedi me nsi on al (3D ) cellular aut om at a ( CA ) . Th e si mul at i on r esults agr ee w ell wit h availa ble exp eri m ent al r esults . This in dicat es t h at t h e 3D dyn a mic CA m odel f or t h e p h ot or esist et chin g si mulat i on a n d t h e 3D CA m odel f or t h e p ostb a k e si mulat i on c oul d be usef ul f or t h e m on olit hic si mul at i on of vari ous lit h ogr ap hy p r ocesses . This is det er mine d t o be usef ul f or t h e devicesize d f abricat i on p r ocess si mulat i on of I C an d M EMS . Key words : cellular aut om at a ; p r