ep,品lj电路板激光投影成像照明系统均匀性分析(Uniformity analysis of LJ EP circuit board laser projection imaging illumination system).docVIP

ep,品lj电路板激光投影成像照明系统均匀性分析(Uniformity analysis of LJ EP circuit board laser projection imaging illumination system).doc

  1. 1、本文档共29页,可阅读全部内容。
  2. 2、原创力文档(book118)网站文档一经付费(服务费),不意味着购买了该文档的版权,仅供个人/单位学习、研究之用,不得用于商业用途,未经授权,严禁复制、发行、汇编、翻译或者网络传播等,侵权必究。
  3. 3、本站所有内容均由合作方或网友上传,本站不对文档的完整性、权威性及其观点立场正确性做任何保证或承诺!文档内容仅供研究参考,付费前请自行鉴别。如您付费,意味着您自己接受本站规则且自行承担风险,本站不退款、不进行额外附加服务;查看《如何避免下载的几个坑》。如果您已付费下载过本站文档,您可以点击 这里二次下载
  4. 4、如文档侵犯商业秘密、侵犯著作权、侵犯人身权等,请点击“版权申诉”(推荐),也可以打举报电话:400-050-0827(电话支持时间:9:00-18:30)。
  5. 5、该文档为VIP文档,如果想要下载,成为VIP会员后,下载免费。
  6. 6、成为VIP后,下载本文档将扣除1次下载权益。下载后,不支持退款、换文档。如有疑问请联系我们
  7. 7、成为VIP后,您将拥有八大权益,权益包括:VIP文档下载权益、阅读免打扰、文档格式转换、高级专利检索、专属身份标志、高级客服、多端互通、版权登记。
  8. 8、VIP文档为合作方或网友上传,每下载1次, 网站将根据用户上传文档的质量评分、类型等,对文档贡献者给予高额补贴、流量扶持。如果你也想贡献VIP文档。上传文档
查看更多
ep,品lj电路板激光投影成像照明系统均匀性分析(Uniformity analysis of LJ EP circuit board laser projection imaging illumination system)

ep,品lj电路板激光投影成像照明系统均匀性分析(Uniformity analysis of LJ EP circuit board laser projection imaging illumination system) This article is contributed by keenss1985 Pdf documents may experience poor browsing on the WAP side. It is recommended that you first select TXT, or download the source file to the local view. Volume third, phase twenty-sixth, May 2009 quantum electric Chinese Journal ELECTRONICS V01.26 No.3 CHINESE JOURNAL OF QUANTUM May 2009 DOI:10.3069/j.issn.1007-5461.2009.03.020 Uniformity analysis of lJ Ep circuit board laser projection imaging illumination system Pei Wenyan, golden week, 2 beams are Lin Qinghua: (1 、 experimental teaching department, Guangdong University of Technology), 2 、 School of physics and opto electronic engineering, Guangdong University of Technology, Guangdong, Guangzhou, Guangdong, Guangzhou 510006; 510006) For the XeF excimer laser with 351 nm wavelength, a large area of high precision, high yield and conventional resist was designed The printed circuit board of light (PCB) laser projection imaging lighting system. According to the excimer laser of partially coherent flat topped Gauss beam (PCFGB) model of micro lens array (MLA) are Cambodia diffraction characteristics are analyzed theoretically. By PCFGB distribution function, the diffraction angle and the Fresnel Kirchhoff diffraction integral formula of constant intensity the quantitative analysis of the influence of diffraction effect of MLA beam. The theoretical calculation shows that the micro lens edge multi beam Fresnel diffraction and micro lens interference can cause light amplitude modulation, but the diffraction peak is more evident in the beam edges. At the same time, the PCFGB curves obtained by numerical integral, found 9 x 9 MLA Cambodia device can ensure the uniformity of the beams from individual microlenses superimposed, and minimize the diffraction and multiple beam interference effect. By using a hexagonal diaphragm Method can not only meet the needs of the large-a

文档评论(0)

f8r9t5c + 关注
实名认证
文档贡献者

该用户很懒,什么也没介绍

版权声明书
用户编号:8000054077000003

1亿VIP精品文档

相关文档