极紫外多层膜技术研究进展-中国光学.PDF

第 3 卷 第 6 期 中国光学与应用光学 Vol. 3 No. 6 2010 年 12 月 Chinese Journal of Optics and Applied Optics Dec. 20 10 文章编号 1674-2915( 2010) 06-0554-12 极 紫 外 多层 膜 技 术 研 究 进 展 张立超 ( 中国科学院 长春光学精密机械与物理研究所 应用光学国家重点实验室, 吉林 长春 130033) 摘要: 在极紫外波段, 任何材料都表现出极强的吸收特性, 因此, 采用多层膜实现高反射率是构建正入射式光学系统的唯 一途径 。本文总结了极紫外多层膜 的发展进程, 叙述 了制备极紫外多层膜 的关键技术( 磁控溅射、电子束蒸发、离子束溅 射) 以及它们涉及 的相关设备 。由于多层膜反射式光学元件主要应用于极紫外光刻与极紫外天文观测, 文 中重点讨论 了 极紫外光刻系统对多层膜性能的要求, 镀膜过程 中的面形精度和热稳定性等 问题; 同时介绍了极紫外天文观测 中使用 的 多层膜 的特点, 特别讨论了多层膜光栅的制备技术和亟待解决的问题 。 关 键 词: 极紫外多层膜; 极紫外光刻; 多层膜光栅 中图分类号: O484 文献标识码: A Progress in EUV multilayer coating technologies ZHANG Li-chao ( State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China) Abstract:All materials have strong absorptin properties in Extreme Ultra Violet( EUV) region. Therefore, it is an only approach to construct a normal incidence optical system by using multilayer coatings to improve its re- flectivity . In this paper, the development of EUV multilayer coatings is introduced and the key technologies for fabricating multilayer coatings ( magnetron sputtering, electron beam evaporating, ion beam sputtering) and their relative apparatus are described. As multilayer coating reflective optical elements are mainly used in the EUV lithography and EUV astrophysics, it lays the emphasis on the study on the characteristics of multilayer coatings in EUV lithographic equipment, and the surface accuracy and thermal stability in coating processing. Furthermore, it also gives the special multilayer coatings for astronomical observations and discusses the fabri- cation of multilayer coating grating