WO3薄膜的光催化性能研究.doc

WO3薄膜的光催化性能研究 摘要 薄膜材料是相对于半导体材料而言的，是人们采用特殊的方法，在半导体材料的表面沉积或制备的一层性质与半导体材料完全不同的物质层。薄膜材料因具有光学性质、电学性质、磁学性质、化学性质、力学性质、热学 性质等多种特性在许多领域得到应用，如电学薄膜、光学薄膜、硬质膜、耐蚀膜、润滑膜、装饰膜、包装膜等。光催化剂在光照的条件下能够产生强氧化性的自由基，该自由基能彻底降解几乎所有的有机物，并最终生成 H2O、CO2 等无机小分子，加上光催化反应还具有反应条件温和，反应设备简单，二次污染小，操作易于控制，催化材料易得，运行成本低，可望用太阳光为反应光源等优点。研究表明WO3光催化稳定性良好，对光催化降解水中污染物也有较理想的催化效果,而且我国钨蕴藏丰富,居世界第一，WO3有广泛来源。 本实验采用钨粉过氧化聚钨酸法制备基础溶胶，找出影响WO3薄膜光催化性能的主要因素研究其对WO3薄膜的成膜性、表面形貌、光催化性能的影响WO3薄膜采用光催化实验分别研究优化的浸渍提拉工艺，脉冲电泳沉积工艺及直流电沉积工艺参数对WO3薄膜光催化性能的影响，找出影响薄膜性能的主要因素，分别对比分析直流工艺，浸渍提拉工艺及脉冲电泳沉积工艺，研究这三种成膜方式对WO3薄膜光催化性能的影响。WO3薄膜WO3薄膜 关键词：WO3薄膜，光催化，浸渍提拉工艺，脉冲电泳沉积工艺，直流电沉积工艺，过氧化聚钨酸 WO3 thin film photocatalytic properties Abstract People with a special method in semiconductor material surface preparation a layer of film materials，it is completely different physicality to semiconductor material. Film materials because of its optical properties, electrical properties, magnetic properties, chemical and mechanical properties, thermal properties, such as various characteristics in many areas to be applications such as electrical film, optical thin film, hard film, corrosion resistant film, lubricant, decorative membrane, packaging film, etc. Light under the condition of catalysts in the illumination can produce strong oxidizing free radicals, this free radicals can thoroughly degraded almost all of the organic matter, and ultimately generate H2O, CO2 and other inorganic of small molecules, plus photocatalytic reaction also has mild reaction condition, reaction, the equipment is simple, secondary pollution small, operation easy control, catalytic materials, low cost and easy operation with the sun light is for reaction etc. Research shows that WO3 photocatalytic good stability, light catalytic degradation water pollutants have ideal catalytic effect, and Chinas tungsten rich, ranking the first, have extensive WO3 source. This experiment used tungsten powder together peroxide based sol prepared tungsten acid legal system adopted in sol, add and non-increase