- 12
- 0
- 约2.42万字
- 约 32页
- 2018-02-24 发布于河南
- 举报
半导体研究2
VACT’s
Rotatable Sputtering
Technology
e
m
a
n
e
l
i
f
/
5
0
0
2
,
3
2
e
n
u
J
1
COMPANY CONFIDENTIAL
Outline
1 Key Requirements for a Modern Magnetron
2 Key Features of VACT’s C-MAG® Cathode
1 Proprietary VAC-MAGTM Endblock
2
原创力文档

文档评论(0)