STREGA P1M1 mirror substratesStrega wp1m1镜基板.pptVIP

Coating thermal noise Temperature dependence of the mechanical dissipation in single layer tantalum pentoxide coatings on thin single-crystal silicon substrates Experiments suggest Silicon is of significant interest as a mirror substrate material for future detectors and its mechanical loss is predicted to decrease at low temperatures. Ta2O5 is the dominant source of dissipation in current ion-beam-sputtered SiO2/Ta2O5 coatings Doping the Ta2O5 with TiO2 can reduce the mechanical dissipation Mechanism responsible for the observed mechanical loss in Ta2O5 as yet not clearly identified Use of thin substrates means coating loss becomes dominant – interpretation of results is easier Sample fabrication The silicon samples have been fabricated by wet etching from silicon wafers at Stanford (Stefan Zappe) The coatings were deposited by LMA. A pair of silicon cantilevers, 52 mm thick were measured. control sample (underwent same oxidation/annealing process as coated sample) Measured mechanical loss Results – 4th bending mode at ~777 Hz Measured mechanical loss ctd Coated silicon cantilever – energy distribution Interpretation: calculating the energy stored in the coating layer Second cantilever Conclusions - coatings Measurements of the loss of a single layer of tantala coating have been made on silicon cantilever substrates Results at low temperature are consistent with: the mechanical loss of tantala increases as temperature decreases ~1.5x10-4 at 290K → ~4.0x10-4 at 80Kpossible dissipation peak at lower temperatures (?) - compare to Yamamoto et al (Phys. Rev. D 74, 022002, 2006) where a similar increase in mechanical loss for silica-tantala (undoped) multilayer coatings is observed at the measured points at 300K and 77K. Further work: in process of adapting cryostats to cool to liquid helium temperature to study coating loss down to 4 K * * GEO S. Reid, I. Martin, J. Hough, S. Rowan Univ. of Glasgow M.M. Fejer, R. Route Stanford University A. Remillieux,