THE ENERGY INFLUX FROM AN R PLASMA TO A …从RF等离子体的能量涌入….pptVIP

The energy influx from an rf plasma to a substrate during plasma processing W.W. Stoffels, E. Stoffels, H. Kersten*, M. Otte*, C. Csambal* and H. Deutsch Department of Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven * Institute for Physics, University of Greifswald, Domstr. 10a, D-17487 Greifswald, Germany. Abstract Aim: determine the energy flux to a substrate in an low pressure rf plasma Method: calorimetric probe Results: Argon: heat flux is few times 10-3 W/cm2 heating mainly due to ions and electrons Oxygen 50% higher heat flux than argon molecular surface processes are important as well Substrate heating: csdT/dt = Fin-Fout Fin = Heat flux Jx times probe surface: ions: kinetic recombination electrons:kinetic neutrals: kinetic, internal, association, chemical photons: blackbody, plasma Fout: thermal conduction of gas and substrate radiation Thermal probe Principle: heat flux determines the heating time of the probe Thermal probe: raw data Experimental setup Capacitively coupled 13.56 MHz plasma. Al electrode D=130mm Spherical reactor D=400mm. Diagnostics: Thermal probe Langmuir probe CCD camera Typical conditions: 1Pa, 15W Ar or O2 Argon: Te = 3.5 eV ne = 2 1015 m-3 Results: Argon Calculated contributions by ions (Ji, Jrec) and electrons (Je) to the thermal balance of the substrate. The calculations are based on ne measured by the Langmuir probe and a Bohm flux. For the electron current (right branch) the measured substrate current is used. Measured data fitted by the model results. Results: Oxygen Similar trends for oxygen and argon Overall higher heat flux in oxygen due to neutral heating ne(oxygen) ne(argon) so electron branch is smaller Conclusions Thermal heat flux to a substrate can be measured by probe Electron, ion and neutral heating can be separated Argon 15W, 1Pa: heat flux few times 10-3 W/cm2. Increases with bias voltage mainly ion (and electron) heating Oxygen 15 W, 1