强流脉冲碳离子束与钛靶相互作用的数值研究-粒子物理与原发子核物理专业毕业论文.pdf.docxVIP

NumencaI NumencaI Study on-nteraction of High Intense PuIsed Carbon lon Beam and Ti T。arget AbStraCt Because ofbeing have many adVantages for imense pulsed ion be锄，it haS been paid more attention to廿1e field of m砷erials．Tms technology describes that the material is i删iated by short—pulsed aIld high-power ion be锄，results in me stnlcnlre aIld components of the surf．aCe challged When prompt heating a11d cooling．In the developed country，mis technology field intense pulsed ion be锄has been applied to material surf．ace modi母ing，film gro、矾h，making nano—size po、^，ders． The imeraction of High·intensit)，pulsed ion be锄谢th Ti ta唱ets is Very short，s0 it is important to mal(e a discussion in theory．Its basis is the simulation of ene娼ies of an intense pulsed ion be锄￡Lbsorbed is basis． Selecting particular pa“lrneter，we researchcd the interaction of矿and C十with the t鹕et of Ti．T11e矿and C+ene玛y is 1 OOkev 300kev and 450keV．7111e depth—conce曲眦ion dis仃ibution aIld ene玛y gradiem distribution was presented a11d discussed． In the process of interacting with Ti target，H+energy loss appeared peak Value in its i彻er．However，C十disposition was much on the su订aCe of Ti ta玛et．Energy distribution waS c孕lculated、Vhen HIPIB interaCted谢th Ti伽曙ets in this p印er．In tlle process of interaCting with Ti ta】罄et，H’energy loss in its iruler．HoweVer，C+ disposition was much on the su娟∞e of Ti target．Dif|Ferent ions haVe di任．erent deptlls disposition and a毹ction． Body Heat F1ux Mode using Element removed aIld reactivated metllod is built t0 simulate the themlal e虢ct of Ti ta唱et imldiated by HIPIB谢th different ene唱y using the ABAQUS FEM(Finite Elemem Method)so小vare．The the肿al data of me metal surf犯e i仃adiated by HIPIB is obtained．The results、Vere giVen wim让Ie pulse Voltage of 200 I(v a11d 200 A／cmz beam densi何We simulate me temperature distribution curve at the din’erent moment．During pulse time，the accelerating Voltage increaSed Ⅱle ta唱et surf：ke heating rate．And the be锄densi够call also increase the heating rate．