表面粗糙度对Cr系薄膜抗沾黏性质影响之研究-YOKEnet.PDF

表面粗糙度對Cr 系薄膜抗沾黏性質影響之研究 Study of Surface roughness on the anti-sticking property of Cr-based coatings by reactive sputtering 楊玉森1* 黃正豐1 陳春澍1 Y.S. Yang C.F. Huang C.S. Chen 摘要 discussed in the micro and nanometer 射出成型拔模時常常因沾黏現象使 scale, the substrate is a high-speed steel 塑膠成品產生破壞影響製程良率。所以 SKH51, nanometer-scale surface 如何降低模具與溶膠的沾黏現象是目前 roughness was grinded and controled to 射出成型必須面對的課題。本研究之抗 4nm, water contact angle is measured at 沾黏性質是以水滴接觸角量測判定。表 74 °. When the surface roughness is 面粗糙度分別以奈米尺度及微米尺度討 controled at micro-scale, in the range of 論。本研究使用基材為高速鋼SKH51 ， 0.22μm to 1.08μm, the contact angle is 表面粗糙度約為奈米尺度4nm ，水滴接 increased with increasing roughness and 觸角約為74° 。利用精密噴砂控制試片表 reaches a maximum value of 120 °. 面。粗糙度在0.22μm至1.08μm範圍內， Nanometer scale surface roughness is 接觸角隨粗糙度增加而上升 ，最高可到 controled by Cr and Cr-N coatings with 達120° ；利用非平衡磁控濺鍍奈米尺度 surface roughness in the range of 2nm to Cr及Cr-N鍍膜於高速鋼表面 ，粗糙度在 6nm and water contact angle increases 2nm至6nm之範圍內，原始底材之74°增 from the original substrate of 74 ° to 112 ° 加至112°與104°，提升了51.4%及40.5% ， and 104 °, improved 51.4% and 40.5%, at 接觸角增加原因主要為Cr與Cr N 鍍膜 nanometer scale the contact angle 2 的貢獻，與粗糙度無關。 increases is not relation to the surface roughness and contributed by the Cr and 關鍵詞：非平衡磁控濺鍍法、Cr系薄膜 、 Cr N coatings. 2 抗沾黏 Keywords: unbalanced magnetron Abstract sputtering, Cr-based film, Injection mold is often damaged due to anti-sticking the sticking phenomenon. How