刻蚀工艺技术应用研究分析毕业设计论文.docVIP

本科毕业设计（论文） PAGE \* MERGEFORMATIII 本科毕业设计（论文） 摘 要 在半导体出现在人们的视野中后，就很大的程度上改变了人类的生活和生产。半导体出了在计算机领域应用之外，还广泛的应用于网络、通信技术、自动化遥控及其国防科技技术领域。而且在运输行业和宇航上的应用和作用也是及其巨大的。 本文主要是介绍一下半导体制造工艺中的刻蚀工艺。对于刻蚀工艺的研究、分析、应用有一个简答的认识。在现在越来越大的硅片尺寸，刻蚀工艺技术扮演着越来越重要的作用，精确细致的刻槽，使最后硅片的想要表现出来的图形越来越完美，所连接的电路越来越精确。 关键词：刻蚀工艺技术；制造；刻蚀设备；气体。 Abstract Since the inception of the semiconductor, which greatly changed the production of human life. In addition to semiconductor applications in the computer field, but also widely used in communications, networking, automatic remote control and national defense science and technology. In addition, in the transport (such as cars, boats, aircraft), and aerospace applications and on the increasingly significant role. This paper describes the etching process of semiconductor manufacturing process. This article mainly introduce semiconductor manufacturing process of etching process For the analysis of the applications of the etching process has a short answer In what is now bigger and bigger size of silicon wafer, etching technology plays a more and more important role, precise and meticulous groove, makes the final silicon want to display graphics is more and more perfect, the connected circuits become more accurate Key words: Etch Process ;Manufacture;Etch Equipment;Gas 刻蚀工艺在硅片制造中的研究分析 目 录 TOC \o 1-3 \h \z \u HYPERLINK \l _Toc262721439 第1章 绪论 1 HYPERLINK \l _Toc262721440 1.1 集成电路制造工艺的发展背景 1 HYPERLINK \l _Toc262721444 1.2 刻蚀在集成电路中的重要意义 3 HYPERLINK \l _Toc262721451 第2章 刻蚀工艺的分类 3 HYPERLINK \l _Toc262721452 2.1 按加工方式分 3 HYPERLINK \l _Toc262721453 2.1.1湿法腐蚀(次要) 3 HYPERLINK \l _Toc262721454 2.1.2干法刻蚀(主要) 5 HYPERLINK \l _Toc262721456 2.2 干法按反应方式分类 7 HYPERLINK \l _Toc262721457 2.2.1 化学性刻蚀(Chemical Etching) 7 HYPERLINK \l _Toc262721458 2.2.2 物理性刻蚀(Physical Etching) 8 HYPERLINK \l _Toc262721459 2.2.3 两者综合性刻蚀(RIE) 9 HYPERLINK \l _Toc262721460 2.3 按刻蚀形貌来分 10 HYPERLINK \l _Toc262721461 2.3.1 硅刻蚀(Siliconpolysilicon) 10 HYPERLINK \l _Toc262721462 2.3