cmo教材资料s的工艺技术.pptVIP

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  • 2019-08-04 发布于湖北
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CMOS工艺技术 * CMOS工艺流程∶ CSMC-HJ Wafer Fabrication Process Technology CMOS CMOS Starting with a silicon wafer Cross Section of the Silicon Wafer Magnifying the Cross Section CMOS n/p-well Formation Grow Thin Oxide Deposit Nitride Deposit Resist silicon substrate UV Exposure Develop Resist Etch Nitride n-well Implant Remove Resist CMOS n/p-well Formation silicon substrate Grow Oxide (n-well) Remove Nitride p-well Implant Remove Oxide Twin-well Drive-in p-well n-well Remove Drive-In Oxide silicon substrate p-well n-well CMOS LOCOS Isolation Grow Thin Oxide Deposit Nitride Deposit Resist UV Expo

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