中频磁控溅射沉积梯度过渡CrCrNCrNCCrC膜的附着性能.PDFVIP

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Vol.17No.8TheChineseJournalofNonferrousMetalsAug.2007

1004-0609(2007)08-1307-06

Cr/CrN/CrNC/CrC

1,212222

(1.410083

2.510651)

Cr/CrN/CrNC/CrC

Cr(SEM)(EDS)

100V6.5kW0.6PaCr

2min4A6.5kWCr

CrC

TG174.444TB43A

AdhesionofCr/CrN/CrNC/CrCgradedinterlayerdepositedby

MF-magnetronsputtering

NIUShi-chao1,2122

,YUZhi-ming,DAIMing-jiang,LINSong-sheng,

HOUHui-jun2,LIHong-wu2

(1.SchoolofMaterialsScienceandEngineering,CentralSouthUniversity,Changsha410083,China;

2.GuangzhouResearchInstituteofNonferrousMetals,Guangzhou510651,China)

Abstract:TheCr/CrN/CrNC/CrCgradedinterlayerwasdepositedbyMF-magnetronsputteringcombinedwithion

sourcetechnique.Twoorthogonalexperimentsweredesignedtostudytherelationshipbetweenadhesionandprocessing

parametersbothforCr-interfaceandinterlayer.Surfacemorphologyandcompositionofgradedinterlayerwere

characterizedbySEMandEDS.Theresultsshowthat,theoptimumdepositionparametersforinterlayerare−100Vbias

voltages,6.5kWMFpowerunderpressureof0.5Pa;theoptimumdepositionparametersforCrlayeraredepositiontime

of2min,ionresourcecurrentof6AandMFpowerof6.5kW.ThedepositionofCrlayerwithhighMFpowerand

assistanceofionbeamcanimprovetheadhesion.

Keywords:CrC;mid-frequencymagnetronsputtering;ionsource;adhe