工业磁控离子电镀的偏置直流脉冲电源控制外文原文.pdfVIP

INDUSTRIAL APPLICATION OF PULSED DC BIAS POWER SUPPLIES IN CLOSED FIELD UNBALANCED MAGNETRON SPUTTER ION PLATING K. E. Cooke, J. Hampshire, W. Southall and D. G. Teer Pulsed dc power supplies are now commonly used in the preservation of critical surface characteristics, are also reactive magnetron deposition of dielectric coatings discussed. SE/517 from conductive or partially conductive sputtering targets. Their advantages, particularly the elimination of arcing and enhanced process stability are well The authors are with Teer Coatings Limited, West recognised. In comparison, the application of pulsed dc Stone House, Berry Hill Industrial Estate, Droitwich, power to the biasing of substrates in ion plating Worcestershire WR9 9AS, UK (kevin.cooke@ processes has received much less attention. The present teercoatings.co.uk). Based on a presentation at the study draws on experience with a range of pulsed dc meeting on ‘Pulsed plasma processing’ held at Salford bias supplies in industrial coating equipment, exploiting University on 17 September 2003. Accepted 26 closed field unbalanced magnetron sputtering technol- February 2004. ogy. Pulsed plasma characteristics have an impact on all stages of the coating process, from initial surface Keywords: Pulsed dc bias power, Closed field cleaning through to interface formation and the coating unbalanced magnetron sputter ion plating, Sputter of components, requiring the appropriate selection of precleaning pulsing parameters. The synergistic interaction of pulsed dc bias, dc and pulsed dc closed field magnetron sources is explored. Practical considerations, such as # 2004 IoM Communications Ltd. Pub