毕业论文--UV-LIGA中SU-8胶的溶胀及其抑制研究.doc

编号 南京航空航天大学 毕业论文 题 目 UV-LIGA中SU-8胶的溶胀及其抑制研究南京航空航天大学 本科毕业设计（论文）诚信承诺书 本人郑重声明：所呈交的毕业设计（论文）（题目：UV-LIGA中SU-8胶的溶胀及其抑制研究 UV-LIGA中SU-8胶的溶胀及其抑制研究 The Swelling and its Suppression of SU-8 Photoresist in UV-LIGA Abstract Micro-manufacturing technology is the most important aspects in the production process from MEMS technology into design,and is the key and basis of MEMS technology. The LIGA technology is the more successful in MEMS research areas for the processing of non-silicon materials.But LIGA technology requires expensive synchrotron radiation light source and a specially designed mask, and the processing cycle. Therefore, in recent years, a variety of LIGA high aspect ratio micro-machining method has been proposed and taken seriously, one of the most practical value is the UV-LIGA technology which based on the SU-8 Photoresist. However, due to the SU-8 Photoresist as a polymer material, immersed in the electroforming solution for a long time when electroformed,the small molecules in the electroforming solution will penetrate the polymer internal while its volume swell severely affectedcontrollability and accuracy of the produced image size, it is the main dimensions of the process error sources in SU-8 Photoresist by UV-UGA and is a key factor to affect the dimensional accuracy of the high-precision micro-devices. In this paper, the law of swelling is obtained by researching swelling characteristic of SU-8 photoresist in gold sulfite solution. The effect of compensating the mask widthe and designing isolation belt in the mask to dimension accuracy of pure gold micro parts is analyzed. Keywords : UV-LIGA, SU-8 photoresis, over exposure, swelling  目 录 摘 要 -ⅰ- Abstract -ⅱ- 第一章 绪论 - 1 - 1.1 课题背景 - 1 - 1.2 LIGA及UV-LIGA技术简介 - 2 - 1.2.1 LIGA技术 - 3 - 1.2.2 UV-LIGA技术 - 4 - 1.2.3 国内外LIGA与UV-LIGA技术的发展现状 - 6 - 1.3 课题的研究意义及主要内容 - 8 - 1.3.1 课题的研究目的及意义 - 8 - 1.3.2 本文研究的主要内容 - 8 - 第二章