ECR-RF双功率源等离子体化学气相沉积制备类金刚石薄膜的研究.pdfVIP

ECR-RF 双功率源等离子体化学气相沉积制备 类金刚石薄膜的研究 桑利军，陈强* （北京印刷学院印刷包装材料与技术北京市重点实验室，北京大兴，102600） 摘要：利用微波ECR 加射频功率源等离子体化学气相沉积技术，以CH 为碳源气体，Ar 4 气为稀释气体，在硅片（100）上制备了类金刚石（DLC ）薄膜。Raman 光谱证实了薄膜的 类金刚石特性；傅立叶变换红外光谱表明薄膜中存在明显的C-H 键结构。采用AFM 观察了 表面形貌，均方根粗糙度大约为 1.489nm，表明薄膜表面比较光滑；最后对其进行了摩擦性 能测试，薄膜的平均摩擦系数为0.102 。 关键词：微波ECR等离子体化学气相沉积；类金刚石薄膜；平均摩擦系数 中图分类号：TB43 文献标识码：A A Study of Diamond-Like Carbon Films Prepared by ECR-RF Dual-Power Source Plasma Chemical Vapor Deposition Sang Lijun, Chen Qiang * （Laboratory of Plasma Physical and Material , Beijing Institute of Graphic Communication, Beijing 102600, China ） Abstract: Diamond-like carbon films were prepared on Si (100) substrates by a Microwave Electron Cyclotron Resonance and Ratio frequency Power Plasma Chemical Vapor Deposition. CH and Ar were respectively used as a source gas of the carbon and a diluted gas. Raman spectra 4 certified the diamond-like carbon characterization of the films; FT-IR spectra indicated that the carbon was bonded with hydrogen participating in bonding. The asperity of the films was checked by atomic force microscope, and the surface RMS was approximately 1.489nm, thus, the film surface was very smooth; the frictional properties test was carried out, and the results showed that the average friction coefficient was as low as 0.102. Key words : Diamond-like carbon films, RF negative bias, structure and performance 1、前言 类金刚石（Diamond-Like Carbon ，简称DLC ）膜的结构及其复杂，它是一种含有sp2 键 和sp3 键的亚稳态非晶碳膜，其实用性能和结构都和金刚石薄膜相似，有些性能甚至超过金 [1] 刚石薄膜 。DLC 薄膜具有一系列和金刚石相似的优良性能，如高硬度、低摩擦系数、高热 [2 ,3] 导性、高电阻