TiO_2薄膜溅射工艺参数对其光催化性能影响.pdfVIP

第 24 卷 　第 2 期 真 　空 　科 　学 　与 　技 　术 　学 　报 　　　　　　　　　　 ( ) 　　　　　　　　　　　　　　 2004 年 3 、4 月 VACUUM SCIENCE AND TECHNOLOGY CHINA 87 　 TiO2 薄膜溅射工艺参数对其光催化性能的影响 侯亚奇 　庄大明　张 　弓　吴敏生 (清华大学机械工程系 　北京 　100084) Influence of Growth Para meters of TiO2 Fil m on Its Photocatalytic Degradation Hou Yaqi ,Zhuang Daming ,Zhang Gong and Wu Minsheng ( Dep artment of Mechanical Engineering , Tsinghua University , B eij ing , 100084 , China) 　　Abstract 　Influence of various growth parameters of TiO2 films grown by midfrequency ,reactive magnetron sputtering on photocatalytic degradation was evaluated in the case of 0 . 02 mmol/ L aqueous methylene blue solution . The results show that under the irradiation of UV light in a dynamic system ,the photocatalytic degradation of the film grown at an oxygen partial pressure higher than 9 % in the Ar/ O sputtering 2 gaseous mixture is almost as good as that sputtered in pure oxygen . The photocatalytic degradation is very sensitive to the film thickness ,basi cally being proportional to film thickness when its thickness is less than 800 nm. Observable photocatalytic property deterioration of the film af ter long time preservation in the dark may be effectively cured by preirradiation of UV light . 　　Key words 　Titanium dioxide thin film ,Technological parameters ,Photocatalytic degradation ,Methylene blue 　　摘要 　利用中频交流反应磁控溅射方法制备 TiO2 薄膜光催化剂 ,研究了溅射工艺参数对薄膜光催化能力的影响 。采用 动态反应系统 ,紫外光源为 TUV ,降解对象为 002 mmol/ L 亚甲基蓝溶液 。结果发现 :Ar/ O2 混合反应溅射在 O2