双面抛光机原理及结构(英文版).docVIP

The Development of the Precise Double Sided Polishing Machine Keywords: double sided polishing, photoelectron material, ultra-smooth surface Abstract. The functional materials such as sapphire, silicon wafer etc. are processed efficiently with ultra-smooth surface for the demand of the rapid development of the IC industry. The precise double sided polishing process is one of the main methods of getting the ultra-smooth surface for these materials. This paper introduces the structure and characteristic of the precise double sided polishing machine with a precise pressure control system equipped