Effects of Impurities in Random Sequential Adsorption on a OneDimensional Substrate.pdfVIP

Effects of Impurities in Random Sequential Adsorption on a One-Dimensional Substrate Jae Woo Lee∗ Department of Physics, Inha University, Inchon 402-751, KOREA 7 Department of Physics, Clarkson University, Potsdam, New York 13699-5820 USA 9 9 1 n a Abstract J 2 2 We have solved the kinetics of random sequential adsorption of linear k-mers 1 v on a one-dimensional disordered substrate for the random sequential adsorp- 7 6 tion initial condition and for the random initial condition. The jamming 1 1 ′ 0 limits θ (∞, k , k) at fixed length of linear k-mers have a minimum point at a 7 ′ 9 particular density of the linear k -mers impurity for both cases. The coverage / t a m of the surface and the jamming limits are compared to the results for Monte - d Carlo simulation. The Monte Carlo results for the jamming limits are in good n o agreement with the analytical results. The continuum limits are derived from c : v the analytical results on lattice substrates. i X r a Typeset using REVT X E ∗E-mail:jwlee@craft.camp.clarkson.edu 1 Random sequential adsorption (RSA) of linear k-mers on a lattice is a model of nonequi- librium deposition process [1–3]. The linear k-mers are deposited at random, sequentially and irreversibly on