间隙可调胶体晶体单层制备技术.pdfVIP

中国科技论文在线 # 间隙可调胶体晶体单层制备技术 耿翀，郑露，余洁，严清峰，王晓青，沈德忠** （清华大学化学系，新型陶瓷与精细工艺国家重点实验室，北京 100084） 5 摘要：将水气界面胶体自组装与化学气相沉积法相结合，制备得到了间隙尺寸可调的胶体晶 体单层。实验中，利用氮气鼓泡装置携载四氯化硅蒸气，与装置内部的水蒸气以气相的方式 进行反应，生成的二氧化硅均匀地沉积在漂浮于水面的胶体晶体单层上，在胶体微球的表面 形成一层二氧化硅壳层，进而使得间隙尺寸均匀的减小。采用这种方法可以制备得到应用于 纳米球刻蚀技术的高质量、间隙尺寸可调的、可转移的胶体晶体单层。 10 关键词：胶体化学与界面化学；单层胶体模板；间隙尺寸可调；纳米球刻蚀 中图分类号：O648; O482. 3; O743; O73; O77; O781; TB52; TQ127 Monolayer colloidal mask with tunable interstice size for nanosphere lithography 15 GENG Chong, ZHENG Lu, YU Jie, YAN Qingfeng, WANG Xiaoqing, SHEN Dezhong (Department of Chemistry, State Key Laboratory of New Ceramics and Fine Processing, Tsinghua University, Beijing 100084) Abstract: In this paper, polystyrene (PS) monolayer colloidal crystal (MCC) with tunable 20 interstice size is prepared by a combination of self-assembly of PS nanospheres at the air-water interface and chemical vapor deposition of silica. Water vapor around the MCC reacts with the silicon tetrachloride steam introduced by nitrogen carrier gas to form silica. Consequently, it induces the formation of a continuous silica layer coating on the surface of each PS sphere, which results in the shrinkage of the interstice between neighboring PS spheres. The method provides a 25 facile approach to the fabrication of interstice-size-tunable, high-quality colloidal masks for nanosphere lithography application. Keywo