Strained SOISGOI dual-channel CMOS technology based on the Ge condensation technique》.pdfVIP

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Strained SOISGOI dual-channel CMOS technology based on the Ge condensation technique》.pdf

Strained SOISGOI dual-channel CMOS technology based on the Ge condensation technique》.pdf

Home Search Collections Journals About Contact us My IOPscience Strained SOI/SGOI dual-channel CMOS technology based on the Ge condensation technique This content has been downloaded from IOPscience. Please scroll down to see the full text. 2007 Semicond. Sci. Technol. 22 S93 (/0268-1242/22/1/S22) View the table of contents for this issue, or go to the journal homepage for more Download details: IP Address: 18 This content was downloaded on 10/10/2015 at 00:25 Please note that terms and co

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