Formationofnanocrystallinemicrostructureinarcionplated.PDFVIP

Formation of nanocrystalline microstructure in arc ion plated CrN films Qi-min WANG 1 1 1, 2 , Se-Hun KWON , Kwang-Ho KIM 1. National Core Research Center for Hybrid Materials Solution, Pusan National University, Busan 609-735, Korea; 2. School of Materials Science and Engineering, Pusan National University, Busan 609-735, Korea Received 21 April 2010; accepted 10 September 2010 Abstract: Applying negative bias voltages caused significant microstructure changes in arc ion plated CrN films. Nanocrystalline microstructures were obtained by adjusting the negative bias voltage. Structural characterizations of the films were carried out using X-ray diffractometry (XRD) and high-resolution transmission electron microscopy (HR-TEM). The results indicated that increasing ion bombardment by applying negative bias voltages resulted in the formation of defects in the CrN films, inducing microstructure evolution from micro-columnar to nanocrystalline. The microhardness and residual stresses of the films were also affected. Based on the experimental results, the evolution mechanisms of the film microstructure and properties were discussed by considering ion bombardment effects. Key words: CrN; thin films; deposition; microstructure; arc ion plating; ion bombardment by adjusting negative bias voltage. However, the detailed 1 Introduction microstructure of the nanocrystalline CrN films was not investigated. The