半导体制备技术简介CH15.pptVIP

Hong Xiao, Ph. D. www2.austin.cc.tx.us/HongXiao/Book.htm Chapter 15Summary and Future Trends The 1960s First IC product Bipolar dominant PMOS Diffusion for doping Metal gate PMOS in the 1960s The 1970s Bipolar dominant NMOS Ion implantation for doping after mid-1970s Self-aligned source/drain Polysilicon gate Main driving force: electronic watches and calculators NMOS in the 1970s The 1980s MOSFET surpassed bipolar CMOS Multi-level interconnections Main driving force: personal computer CMOS in the 1980s The 1990s MOSFET dominant CMOS Multi-level interconnections Tungsten Silicide CMP Main d