激光干涉光技术研究.docVIP

编号 激光干涉光刻技术研究 Laser interference photolithography technology research 学 生 姓 名 王新舜 专 业 电子科学与技术 学 号 1112129 指 导 教 师 分 院 光电科学分院 2015年 X月 摘 要 本文研究的是基于激光干涉光刻的相关理论，综合论述激光干涉光刻的基本原理、主要类型、发展趋势及当前未解决的难题。干涉光刻技术是一个无需用到复杂的光学系统或光掩膜而制备精细结构的技术手段，干涉光刻技术集激光、干涉和衍射光学及光学光刻于一体。激光干涉光刻作为一种新兴的光刻技术，具有设备简单、价格低廉、高效率高分辨率和大视场曝光等待点，对其进行系统的研究，对推进光学光刻极限，发展纳米微电子和光电子器件、新型大屏幕平板显示器和新型光刻机具有重要意义和广阔的应用前景。 关键词：光学光刻;全息光刻技术;干涉光刻技术 ABSTRACT This paper researches on related theories of laser interference lithography based on basic principle of lithography, laser interference, comprehensive exposition of the main types, development trend and the current outstanding problem. Interferometric lithography is a no need to use the complex optical system or optical mask and preparation technology of fine structure, interference lithography, interference and diffraction in laser optics and optical lithography in one. As a new kind of laser interference lithography, has the advantages of simple equipment, low price, high efficiency and high resolution and large field exposure waiting point, to study it, to promote the development of nano optical lithography limit, microelectronic and optoelectronic devices, a new large screen flat panel display and a new lithography has important significance and broad application prospect. Keywords: Optical lithography holographic lithography interference lithography 目 录 TOC \o 1-3 \h \z \u HYPERLINK \l _Toc4764 绪 论 PAGEREF _Toc4764 1 HYPERLINK \l _Toc14569 第一章 方案设计 PAGEREF _Toc14569 2 HYPERLINK \l _Toc18611 1.1 功能要求 PAGEREF _Toc18611 2 HYPERLINK \l _Toc24820 1.2 方案选择 PAGEREF _Toc24820 2 HYPERLINK \l _Toc4674 1.3 方案论证 PAGEREF _Toc4674 3 HYPERLINK \l _Toc23893 第二章 系统总体的设计 PAGEREF _Toc23893 5 HYPERLINK \l _Toc14234 2.1 系统总体的设计 PAGEREF _Toc14234 5 HYPERLINK \l _Toc11522 第三章 系统硬件的设计 PAGEREF _Toc11522 6 HYPERLINK \l _Toc23575 3.1 AT89S52的结构和功能 PAGEREF _Toc23575 6 HYPERLINK \l _Toc3359 3.1.1 AT89S52引脚结构 PAGEREF _Toc3359 6