Filling And Slotting Analysis and Algorithms填充和开槽分析与算法.pptVIP

Subwavelength Optical Lithography: Challenges and Impact on Physical DesignPart II: Problem Formulations and Tool Integration Andrew B. Kahng, UCLA CS Department ISPD-99 TUTORIAL April 13, 1999 Forcing Trends in EDA Silicon complexity and design complexity many opportunities to leave major $$$ on the table issues: physical effects of process, migratability design rules more conservative, design waivers - device-level layout opts in cell-based methodologies Verification cost increases dramatically Prevention a necessary complement to checking Successive approximation = design convergenc