Photoresists The University of Oklahoma Department 光致抗蚀剂俄克拉何马大学.pptVIP

下载本文档

3
0
约3.8千字
约 11页
2017-03-08 发布于上海
举报
版权申诉

Photoresists The University of Oklahoma Department 光致抗蚀剂俄克拉何马大学.ppt

1、原创力文档（book118）网站文档一经付费（服务费），不意味着购买了该文档的版权，仅供个人/单位学习、研究之用，不得用于商业用途，未经授权，严禁复制、发行、汇编、翻译或者网络传播等，侵权必究。。
2、本站所有内容均由合作方或网友上传，本站不对文档的完整性、权威性及其观点立场正确性做任何保证或承诺！文档内容仅供研究参考，付费前请自行鉴别。如您付费，意味着您自己接受本站规则且自行承担风险，本站不退款、不进行额外附加服务；查看《如何避免下载的几个坑》。如果您已付费下载过本站文档，您可以点击这里二次下载。
3、如文档侵犯商业秘密、侵犯著作权、侵犯人身权等，请点击“版权申诉”（推荐），也可以打举报电话：400-050-0827(电话支持时间：9:00-18:30)。
4、该文档为VIP文档，如果想要下载，成为VIP会员后，下载免费。
5、成为VIP后，下载本文档将扣除1次下载权益。下载后，不支持退款、换文档。如有疑问请联系我们。
6、成为VIP后，您将拥有八大权益，权益包括：VIP文档下载权益、阅读免打扰、文档格式转换、高级专利检索、专属身份标志、高级客服、多端互通、版权登记。
7、VIP文档为合作方或网友上传，每下载1次，网站将根据用户上传文档的质量评分、类型等，对文档贡献者给予高额补贴、流量扶持。如果你也想贡献VIP文档。上传文档

Photoresists The University of Oklahoma Department 光致抗蚀剂俄克拉何马大学

OU NanoLab/NSF NUE/Bumm Johnson ACTFEL Alternating Current Thin Film Electroluminescent Lamps Objective Use photolithography to pattern ITO Develop photoresist and etch ITO Apply layers of phosphors, dielectric, and silver Power up lamp Troubleshoot Preparation and Priming Prepare the substrate (glass, with ITO): Wash with appropriate solvent to remove any dirt and other impurities Acetone, MeOH Dry with Nitrogen Deposit Primer Chemical that coats the substrate and allows for better adhesion of the resist, HMDS Spin-Coating the Resist Spin-coat the photoresist onto the surface of the glass RPM: 4500 Time: 42 sec Produces a thin uniform layer of photoresist on the glass surface. Use red/amber safe light at this stage Soft-Baking Put on hotplate Temperature: 115°C, Time: 5 min Removes volatile solvents from the coating Makes photoresist imageable Hardens to amorphous solid Be careful not to overbake and destroy the sensitizer Be careful not to not soft-bake Mask Alignment and Exposure Photomask is a square piece of transparency printed on by a laser printer Maximize light intensity using photo-detector Remove all shadows from exposure area After alignment, the photoresist is exposed to the UV lamp Photoresist Developer Highly pure buffered alkaline solution Removes proper layer of photoresist upon contact or immersion Degree of exposure affects the resolution curves of the resist Immerse wafer in developer and swirl around for 90 seconds Wash developed wafer with deionized water and dry with nitrogen Etching the ITO Put glass in a beaker of 20% HCl, 5% HNO3 Heat beaker for 10 minutes in water bubble bath Check for infinite resistance across The Gap Fix Gap with razor blade if necessary Remove wafers and wash in acetone Dry with Nitrogen Applying Thin Films After the ITO is patterned the ACTFEL lamp can be made. Each layer comes packaged separately as a thick paste (stir before using). The thickness of each layer is controlled by using scotch tape as a spacer. Ap