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AZ GXR 601 presentation
The information contained herein is, as far as we are aware, true and accurate. However, no representations
or warranties, either express or implied, whether of merchantable quality, fitness for any particular
purpose or of any other nature are hereby made in respect of the information contained in this
presentation or the product or products which are the subject of it. In providing this material, no license or
other rights, whether express or implied, are given with respect to any existing or pending patent, patent
application, trademarks, or other intellectual property right.
AZ? GXR-601-46 cps
Non-critical, High Throughput I-line photoresists
EL, DOF, and Linearity for 3μm Iso/Dense Lines
and 3μm Dense Contact Holes
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.
2
Process Conditions
General Processing:
Substrate : Primed Si
Coat: TEL MARK VIII Ttarget = 2.94μm (emax)
Softbake: 90°C / 90sec
Exposure : ASML/250, i-line stepper COG reticle
Conventional Illumination 0.54NA , 0.50 Sigma
Post Exposure Bake : 110°C / 90 sec
Develop : TEL MARK VIII : AZ 300MIF / 60 sec Single puddle at 23°C.
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.
3
Performance Summary
3.0
3.5
3.5
DOF (um)
AZ GXR-601
1.5522383 μm Dense C/H
0.7421853 μm Iso L/S
0.8471793 μm Dense L/S
Linearity (um)EL (%)DTP (mJ)Feature (CD)
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.
4
AZ? GXR-601, 46 cps
Spin Speed Curve
45767
36938
31633
28337
25783
23817
22185
20924
19827
18000
19500
21000
22500
24000
25500
27000
28500
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