网站大量收购独家精品文档,联系QQ:2885784924

Conversion efficiency in silicon solar cells with spatially non-uniform doping.pdf

Conversion efficiency in silicon solar cells with spatially non-uniform doping.pdf

  1. 1、本文档共6页,可阅读全部内容。
  2. 2、原创力文档(book118)网站文档一经付费(服务费),不意味着购买了该文档的版权,仅供个人/单位学习、研究之用,不得用于商业用途,未经授权,严禁复制、发行、汇编、翻译或者网络传播等,侵权必究。
  3. 3、本站所有内容均由合作方或网友上传,本站不对文档的完整性、权威性及其观点立场正确性做任何保证或承诺!文档内容仅供研究参考,付费前请自行鉴别。如您付费,意味着您自己接受本站规则且自行承担风险,本站不退款、不进行额外附加服务;查看《如何避免下载的几个坑》。如果您已付费下载过本站文档,您可以点击 这里二次下载
  4. 4、如文档侵犯商业秘密、侵犯著作权、侵犯人身权等,请点击“版权申诉”(推荐),也可以打举报电话:400-050-0827(电话支持时间:9:00-18:30)。
查看更多
Conversion efficiency in silicon solar cells with spatially non-uniform doping

32 ? 1999, Institute of Semiconductor Physics, National Academy of Sciences of Ukraine Semiconductor Physics, Quantum Electronics Optoelectronics. 1999. V. 2, N 3. P. 32-37. Pacs: 84.60.J; 72.20.J Conversion efficiency in silicon solar cells with spatially non-uniform doping A.V. Sachenko, N.A. Prima, A.P. Gorban Institute of Semiconductor Physics, NAS of Ukraine 45, prospect Nauki, 252650 Kyiv, Ukraine Abstract. The conversion efficiency of diffusion-type silicon solar cells, η, is studied theoretically in assumption of different doping levels existing under collection grid contacts and within the inter-contact spacing. It is shown that at high under-contact doping levels and at relatively low inter-contact doping ones the conversion efficiency increases as compared to uniform doping case. The dependence of η on Shockley-Reed-Hall carrier lifetimes both in the base and in the top-surface n + -layer as well as on the depth of p-n-junction and the shape of electron concentration profile, N(x), in the n + -region is analysed. Keywords: silicon solar cell, p-n-junction, conversion efficiency. Paper received 02.07.99; revised manuscript received 25.10.99; accepted for publication 26.10.99. 1. Introduction As shown in papers [1-3], extremely high values of conver- sion efficiency in diffusion-type n + -p-p + silicon solar cells (SC) can be achieved only at high doping levels of n + - and p + -regions and at small thickness of top-surface n + -layer ( ≤ 10 -5 cm -3 ). That is caused by the necessity of minimiza- tion of SC internal resistance, effective surface recombina- tion rates under top and rear surface contacts and recombina- tion losses resulting from bulk recombination in the highly doped n + - region. Important part of energy losses in SC is caused by short-circuit current reduction due to recombina- tion of minority carriers and due to absorption of photo- active part of sun-light flux by free charge carriers within highly doped n + - and p + - regions. Be

文档评论(0)

l215322 + 关注
实名认证
内容提供者

该用户很懒,什么也没介绍

1亿VIP精品文档

相关文档