Next Generation Non-Vacuum, Maskless, Low Temperature Nanoparticle Ink Laser Digital Direct Metal Patterning for a Large Area Flexible Electronics 英文参考文献.docVIP
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Next Generation Non-Vacuum, Maskless, Low Temperature Nanoparticle Ink Laser Digital Direct Metal Patterning for a Large Area Flexible Electronics 英文参考文献
NextGenerationNon-Vacuum,Maskless,Low
TemperatureNanoparticleInkLaserDigitalDirectMetal
PatterningforaLargeAreaFlexibleElectronics
JunyeobYeo1,SukjoonHong1,DaehooLee2,NicoHotz3,Ming-TsangLee4,CostasP.Grigoropoulos2*,
SeungHwanKo1*
1Applied Nano Technology and Science Lab, Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, Korea, 2Laser
Thermal Lab, University of California, Berkeley, California, United States of America, 3Duke University, Department of Mechanical Engineering and Materials Science,
Thermodynamics and Sustainable Energy Lab, Durham, North Carolina, United States of America, 4Department of Mechanical Engineering, National Chung Hsing
University,Taichung,TaiwanR.O.C.
Abstract
Flexibleelectronicsopenedanewclassoffutureelectronics.Thefoldable,lightanddurablenatureofflexibleelectronics
allows vast flexibility in applications such as display, energy devices and mobile electronics. Even though conventional
electronics fabrication methods are well developed for rigid substrates, direct application or slight modification of
conventionalprocessesforflexibleelectronicsfabricationcannotwork.Thefutureflexibleelectronicsfabricationrequires
totallynewlow-temperatureprocessdevelopmentoptimizedforflexiblesubstrateanditshouldbebasedonnewmaterial
too.Herewepresentasimpleapproachtodevelopingaflexibleelectronicsfabricationwithoutusingconventionalvacuum
deposition and photolithography. We found that direct metal patterning based on laser-induced local melting of metal
nanoparticle ink is a promising low-temperature alternative to vacuum deposition– and photolithography-based
conventional metal patterning processes. The ‘‘digital’’ nature of the proposed direct metal patterning process removes
theneedforexpensivephotomaskandallowseasydesignmodificationandshortturnaroundtime.Thisnewprocesscanbe
extremelyusefulforcurrentsmall-volume,large-varietymanufacturingparadigms.Besides,simple,scalable,fastandlow-
temperature processes
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