沉积温度和碳纳米管对CVD SiC涂层微观形貌的影响.pdfVIP

学兔兔 第1 5卷第5期 粉末冶金材料科学与工程 2010年10月 、，01．15 No．5 Materials Science and Engineering of Powder Metallurgy Oct．2010 沉积温度和碳纳米管对CVD SiC涂层微观形貌的影响 张 翔，李 军，廖寄乔，谭周建 (中南大学 粉末冶金国家重点实验室，长沙 410083) 摘 要：以三氯甲基硅烷(CH3SiC13)为前驱体，采用化学气相沉积法(Chemical vapor deposition，CVD)，在原位生 长有碳纳米管(Carbon nanotubes，CNTs)的C／C复合材料表面制备SiC涂层。用扫描电镜(SEM)和X射线能谱仪 (EDS)观察和分析涂层微观形貌及成份。研究沉积温度(1 000～1 150℃)对SiC涂层的表面、截面以及SiC颗粒的 微观形貌的影响。结果表明：在1 000℃下反应时，得到晶须状SiC；沉积温度为1 050℃时涂层平整、致密；沉 积温度提高到1 100℃时，涂层粗糙，致密度下降；1 150℃下形成类似岛状组织，SiC颗粒团聚长大，涂层粗糙， 并有很多裂纹和孔洞，致密度低。对涂层成份和断口形貌研究表明，基体和涂层之间有1个过渡区，SiC涂层和 基体之问结合良好。 关键词：炭／炭复合材料；CNT-SiC复合涂层；碳纳米管；CVD 中图分类号：TB332 文献标识码：A 文章编号：1673—0224(2010)5—511—05 Effects of deposition temperature and carbon nanotubes on microstructure of SiC coating by CVD ZHANG Xiang，LI Jun，LIAO Ji—qiao，TAN Zhou-jian (State Key Laboratory ofPowder Metallurgy,Central South University，Changsha 410083，china) Abstract：SiC coating was deposited on C／C composites(pre—deposited with carbon nanotubes)by chemical vapor deposition(CVD)method using CH3SiC13 as the precursor．Coating micro—morphologies and composition were investigated by SEM and EDS．respectively．Effects of deposit temperature in the range of 1 000～1 1 50℃ on the surface morphologies and microstructures in the cross section of SiC coatings were studied in detail．The results show that the whisker-like SiC coating can be obtained at 1 000℃，smooth and compact coating is obtained at 1 050℃，increasing temperature tp 1 100℃，the coating becomes coarseness and density decrease，When deposit temperature is 1 1 50℃， SiC particles gathers and gro