193nm光场均匀性检测的嵌入式系统设计(改).docVIP

193nm光场均匀性检测的嵌入式系统设计 Embedded System Design on Uniformity Detecting of Laser Field Used for 193nm Lithograph 摘要 193nm投影曝光光刻系统中，照明系统的设计，要求掩模面和硅片面的光强分布必须达到高度均匀，光强的均匀性直接影响着投影光刻的刻蚀质量。另外，光强的均匀分布还可以避免能量过度集中对光学元件的损伤。因此对193nm照明系统光场均匀性的高精度检测，不仅在光刻机的生产过程中为照明系统与光刻物镜的设计提供参考与反馈，而且能够提高光刻机的刻蚀精度与分辨率，提高光刻产品的质量和可靠性。 Abstract Optical projection lithography is photetch that is a mainstream of the present International Integrated Circuit, which is the most widely used and has the most tenacious vitality .In the 193nm projection exposure lithography system, the design of Lighting system requires that light intensity on the surface of mask and silicon chip must achieve uniform distribution, and uniform distribution of light intensity directly affects the etching quality of lithography. Besides, uniform distribution of light intensity can also avoid damage of optical elements that caused by excessive energy concentration. Therefore, the high-precision detection about uniformity of light field in the illuminate system for 193nm lithography does not only offer reference and feedback when designing lighting system and lithography lens in the production process of lithography, but also improves etching precision and resolution of machine, and improves quality and reliability of lithography products. 嵌入式技术是以计算机为基础，用于实现对其它设备的控制、监测或管理等功能,并且软硬件可裁剪。21世纪以来广泛应用于控制领域，已成为现代电子领域的重要研究方向之一。本文主要针对我国目前研制的193nm ArF光刻设备照明系统，结合先进的嵌入式技术进行了光场均匀性检测的研究，在查阅了大量文献和资料进行了大量研究和设计的基础上，主要完成了以下几个方面的工作： Embedded technology is based on computers, which is used to realize the effect on other devices such as control，monitoring and managementnd software and hardware can be cropped. It is widely applied in control field since the beginning the 21st century, and this technology has already become one of the important modern electronic research aspects . This article is point at 193nm ArF lithography equipment lighting system that is current development in China, and combined with advanced embedded tec