p033大面积电感式耦合电浆源与专利分析林东颖-机械工业杂志.PDF

平面顯示器製程設備技術專輯 電漿均勻性、氣體管路設計、介電窗面積與線圈長 關鍵詞 度是否會產生駐波等相關問題，本文針對大面積電 感式耦合電漿源進行探討並討論相關專利所提出的 ‧電感式耦合電漿源 架構。 Inductively Coupled Plasma Source Inductively coupled plasma is major used in dry ‧大面積電漿激發模組 etching and chemical vapor deposition. Comparing to Large scale plasma excitation module Capacitively coupled plasma, ICP has higher plasma ‧電感式耦合電漿源專利分析 density, slight substrate bombardment, lower operating Inductively Coupled Plasma Source Patent Analysis pressure, and easy to scale up. Large-scale coils need to improve the uniformity of plasma density, suitable gas inlet design, and avoid the standing wave effect. This 摘要 article makes a research about ICP Source and discusses some structures of related patents. 電感式耦合電漿源(ICP)主要用於蝕刻、鍍膜等 相關製程，目前有半導體、TFT LCD、太陽能、軟性 電子等產業應用，ICP 較傳統電容式耦合電漿 前言 (