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- 2017-07-01 发布于湖北
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SemiconductorManufacturingCMP先进CMOS晶体管中实现金属栅工艺
Semiconductor Manufacturing
C M P
CMOS
CMP
kHKMGCMOS
Gate-lastkHKMGCMP
CMP
CMP
,CMPCMP,CMP
10nm
CMPkHKMG
IC CMP steps utilized
50
BEOL new
40
BEOL existing CMP
FEOL new
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