测量时延在线估计与批间控制器协同设计-控制理论与应用.pdf

第33 卷第1 期 控制 理 论 与 应 用 Vol. 33 No. 1 2016 年1 月 Control Theory Applications Jan. 2016 DOI: 10.7641/CTA.2016.50337 测测测量量量时时时延延延在在在线线线估估估计计计与与与批批批间间间控控控制制制器器器协协协同同同设设设计计计 万 莉, 谭 斐, 潘天红 (江苏大学电气信息工程学院, 江苏镇江212013) 摘要: 批间控制是半导体批次生产过程中常用算法, 其关键问题在于能够及时获取上一批次的制程输出, 受测量 手段及其成本限制, 实际的生产制程很难满足这一要求. 为此, 本文提出一种基于贝叶斯统计分析的测量时延估计 算法. 在分析晶圆质量与实测时延、估计时延、以及制程漂移之间的逻辑关系的基础上, 并将晶圆的质量信息按加 工时间顺序划分两个相邻的滚动时间窗口. 基于贝叶斯后验概率函数, 及时捕获后一个滚动时间窗口内过程输出 发生漂移的概率, 从而判断是否有测量时延发生, 并估算该时延大小. 在此基础上, 给出批间控制器的测量时延补 偿策略, 及时调整制程的控制量, 提高晶圆的加工品质. 仿真结果验证所提出算法的有效性. 关键词: 批间控制; 双指数加权滑动平均; 时延; 贝叶斯理论 中图分类号: TP273 文献标识码: A Online estimation of time-varying metrology delay and run-to-run control co-design WAN Li, TAN Fei, PAN Tian-hong (School of Electrical and Information Engineering, Jiangsu University, Zhenjiang Jiangsu 212013, China) Abstract: Run-to-run (R2R) control has been widely used in the semiconductor manufacturing processes. The core of the algorithm is to obtain the process output at previous runs. Restricted by the measurement tool and cost, it is impossible to obtain the quality data timely. We propose an estimation algorithm for estimating the time-varying metrology delay by using the Bayesian statistical analysis. Firstly, we analyze the logical relationship among the wafer quality, the real measurement time-delay, the estimated measurement time-delay and the drift of the process. The wafer quality data is divided into two parts and put in two adjacent moving windows according to the wafer manufacturing sequence. Then, the occurrence