联氨鄄氨配合体系化学镀纯镍工艺 - 表面技术.pdf

摇摇摇 48 宋秉政等摇 联氨鄄氨配合体系化学镀纯镍工艺 联氨鄄氨配合体系化学镀纯镍工艺 宋秉政,赵亚萍,蔡再生 (东华大学 生态纺织教育部重点实验室,上海201620) 摘摇 要: 目的摇 优化联氨鄄氨配合体系化学镀纯镍的工艺条件。 方法摇 以壳聚糖为织物的预处理剂,通过 单因素实验,探讨化学镀镀液各组分的浓度和pH值、温度、施镀时间等因素对化学镀纯镍锦纶织物的方 阻和增重率的影响。 结果摇 最优化学镀工艺条件如下:乙酸镍质量浓度45 g/ L,水合肼质量浓度20 g/ L, 硫酸铵质量浓度8 g/ L,镀液pH值为9,施镀温度为75 益,施镀时间为2 h。 结论摇 采用此反应体系,锦 纶织物经壳聚糖改性处理后,可在最优施镀工艺条件下得到纯镍镀层,且镀层致密,方阻较小。 关键词:化学镀纯镍;水合肼;壳聚糖;方阻 中图分类号:TQ153.1摇 摇 摇 文献标识码:A摇 摇 摇 文章编号:1001鄄3660(2013)06鄄0048鄄04 Study on the Process Hydrazine Reduction of Electroless Pure Nickel Plating SONGBing鄄zheng,ZHAO Ya鄄ping,CAI Zai鄄sheng (Key Laboratory of Science Technology of Eco鄄textiles,Ministry of Education,Donghua University,Shanghai201620,China) ABSTRACT:Objective摇 In thispaper,the optimal process conditionsof electrolessnickel plating in hydrazine鄄am鄄 monia complex system were studied. Methods摇 With chitosan as a pretreatment agent,the influences of the concen鄄 tration of each component in the plating bath and the processing conditions were discussed. Results摇 The optimal process conditionswere asfollows:the concentration of nickel acetate45 g/ L,the concentration of hydrazine hydrate 20 g/ L,the concentration of ammonium sulfate8 g/ L,the pH value of bath9,the temperature of electroless plating 75 益,the timeof electrolessplating2 h. Conclusion摇 Inthisreaction system,polyamidefiber modifiedby chitosan can obtain thick and firm adherence electroless pure nickel coating,and lower square resistance,under the optimal technological conditions. KEY WORDS:electroless pure nickel;hydrazine hydrate;chitosan;square resistance 摇 摇 随着电子技术的飞速发展,人们生产和生活中使 染后的第四大公害。 电磁屏蔽技术是控制电磁污染的 用的电子设备和产品越来越多,而大多数的电子产品, 有效手段之一,它主要是采用各种屏蔽材料对电磁辐 如高频加热炉、微波发生器、计算机、空调机以及无线 射进行有效的阻隔或是损耗。 有研究表明,金属化织