教材分析 MIT机电工程与计算机科学系【本科生课程】6.152J.微纳加工技术.MicroNano.Processing.Technology[www.ed2kers.com].pdfVIP

Micro/Nano Processing Technology As taught in: Fall 2005 A device pad structure, shown with a penny for scale. (Image courtesy of Georgia Tech Center for Low Cost Electronics Packaging Research; photo by Stanley F. Leary. Image provided by theNational Science Foundation Image Library.) Instructors: Prof. Martin Schmidt Susan Ruff Dr. Robert O’Handley MIT Course Number: 6.152J / 3.155J Level: Undergraduate Course Description This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology. Syllabus Course Meeting Times Lectures: Two sessions / week, 1.5 hours / session Labs: One session / week (9 weeks), 4 hours / session 请点击 /ocwdonate Course Overview This course introduces the theory and technology of micro/nano fabrication. Because of the interdisciplinary nature of the subject, its content includes concepts from many disciplines in engineering (electrical, materials, mechanical, chemical) and science. In lecture, we will discuss the theory of basic processing techniques, such as diffusion, oxidation, photolithography, chemical vapor deposition, physical vapor deposition, etching, and metallization. In the labs section of this course, we will be fabricating three different devices; an MOS capacitor, a microcantilever, and a microfluidic device. You will test each device in the lab and prepare a laboratory report for each device. At the end of this course, one should