粗化液中钯离子对ABS塑料直接电镀的影响.pdfVIP

16 1 Vo l16 N o1 2 0 0 8 2 MATER IALS SCIENCE TECHNOLOGY Feb. , 2008 ABS 王桂香, 李 宁, 黎德育 ( , 150001, Em il: w gx0357@ 126. com ) : 粗化是实现活化液在A BS表面吸附的前提和获得良好结合力的必要条件. 采用含痕 钯离子的铬 酐 - 硫酸粗化液对 ABS塑料表面进行化学粗化, 用 AFMXPS 和胶体钯吸附 等对粗化前后塑料的表面性 能价键状态和活性进行了考察. 结果表明: 钯离子加入到粗化液中对 ABS表面的粗糙度影响不显著, 粗化 后的表面氧含 升高; 随着粗化液中钯离子浓度的增加, 胶体钯在ABS表面上的吸附 增加; 增加粗化液中 的 Pd 含 可使A BS表面在低浓度胶体钯溶液中达到与高浓度钯相同的吸附 , 有效地降低了胶体钯的浓 度. 粗化液中加入钯离子不影响基体与镀层的结合力. : ABS塑料; 粗化; 钯; 结合力; 直接电镀 : TQ1533 : A : 1005- 0299( 2008) 01- 0058- 04 Inf luence of Pd ions in th e chem ical etch ing solution on direct copper p lating WANG Gu ix i ng, LI N ing, LI Deyu ( Dept. ofApplied Chem istry, H rb in Institute of T echnology, H rbin 15000 1, Ch in , Em il: wgx0357@ 126. com ) Abs tract: The etching is the essenti l condition w hich m kes ctiv tion dsorbing on ABS surf ce nd c quires good cohension. ABS surf ce w s etched by d ipp ing into chrom ic cidsulfuric cid cont in ing tr ce mount of p ll dium. The surf ce roughness, ctivity nd v lence bondw ere ch r cterized by tom ic forcem i croscopy( AFM), Xr y photoelectron spectroscopy ( XPS) nd the mount of p ll dium dsorption. The re su lts show ed th t theABS surf ce roughnessw sn t ffect by the Pd ions in etch ing solution. The oxygen con tent incre ses nd form s l rge mount of pol r function l group fter etching cont ined Pd ions, thus the mount of colloids p ll dium dsorption incre sed. The s me Pd dsorption c n be obt ined from the low er con centr tion of Pd colloids solu tion by incre sing of Pd ions in etch ing solution. The cohesion betw een copper l yer nd ABS pl stics w sn t ffected by the etch ing solution cont ined Pd ions. K ey w ord s: ABS pl stics;