structural and electrical characterization of bi2vo5.5 bi4ti3o12 bilayer thin films deposited by pulsed laser ablation technique结构和电子特性bi2vo5.5 bi4ti3o12双层薄膜沉积的脉冲激光烧蚀技术.pdfVIP

  • 4
  • 0
  • 约4.05万字
  • 约 6页
  • 2017-08-29 发布于上海
  • 举报

structural and electrical characterization of bi2vo5.5 bi4ti3o12 bilayer thin films deposited by pulsed laser ablation technique结构和电子特性bi2vo5.5 bi4ti3o12双层薄膜沉积的脉冲激光烧蚀技术.pdf

structural and electrical characterization of bi2vo5.5 bi4ti3o12 bilayer thin films deposited by pulsed laser ablation technique结构和电子特性bi2vo5.5 bi4ti3o12双层薄膜沉积的脉冲激光烧蚀技术

Vol.2, No.10, 1073-1078 (2010) Natural Science /10.4236/ns.2010.210133 Structural and electrical characterization of Bi VO / 2 5.5 Bi Ti O bilayer thin films deposited by pulsed laser 4 3 12 ablation technique Neelam Kumari, Saluru Baba Krupanidhi, Kalidhindi Balakrishna Raj

您可能关注的文档

文档评论(0)

1亿VIP精品文档

相关文档