x-ray photoelectron spectroscopy and raman spectroscopy studies on thin carbon nitride films deposited by reactive rf magnetron sputteringx射线光电子能谱和拉曼光谱研究薄反应射频磁控溅射沉积氮化碳薄膜.pdfVIP

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x-ray photoelectron spectroscopy and raman spectroscopy studies on thin carbon nitride films deposited by reactive rf magnetron sputteringx射线光电子能谱和拉曼光谱研究薄反应射频磁控溅射沉积氮化碳薄膜.pdf

x-ray photoelectron spectroscopy and raman spectroscopy studies on thin carbon nitride films deposited by reactive rf magnetron sputteringx射线光电子能谱和拉曼光谱研究薄反应射频磁控溅射沉积氮化碳薄膜

World Journal of Nano Science and Engineering, 2012, 2, 92-102 /10.4236/wjnse.2012.22012 Published Online June 2012 (http://www.SciRP.org/journal/wjnse) X-Ray Photoelectron Spectroscopy and Raman Spectroscopy Studies on Thin Carbon Nitride Films Deposited by Reactive RF Magnetron Sputtering 1* 1 2 1 Masao Matsuoka , Sadao Isotani , Ronaldo D. Mansano , Wilmer Sucasaire , Ricardo A. C

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