(英文)用于液晶显示器的SLM-based无掩模光刻技术.pdf

Applied Surface Science 255 (2009) 7835–7840 Contents lists available at ScienceDirect Applied Surface Science journal h omepage: /locate/apsusc Review SLM-based maskless lithography for TFT-LCD Kwang-Ryul Kim a, Junsin Yi a, Sung-Hak Cho b, Nam-Hyun Kang c, Myung-Woo Cho d, Bo-Sung Shin e, Byoungdeog Choi a,* a School of Information and Communication Engineering, SungKyunKwan University, Suwon 440-746, Republic of Korea b Nano Machining Laboratory, Korea Institute of Machinery and Material, 171 Jang-dong, Yuseong-Gu, Daejeon, 305-343, Republic of Korea c Department of Materials Science and Engineering, Pusan National University, Busan 609-735, Republic of Korea d Department of Mechanical Engineering, Inha University, Incheon 402-751, Republic of Korea e ERC/NDMS, Pusan National University, Busan 609-735, Republic of Korea A R T I C L E I N F O A B S T R A C T Article history: Maskless photolithographic methods have been developed using digital micromirror devices (DMDs) Received 13 April 2009 and grating light valves (GLVs), which are spatial light modulators (SLMs), because liquid crystal display Received in revised form 17 April 2009 (LCD) panel industries spend huge amounts of money for the cost of TFT (thin film resist)-LCD Accepted 10 May 2009 photomasks. The technology has been developed for implementing 2 mm bitmap resolutions, which is a Available online 15 May 2009 requirement for the lithograp