新型储液储气式无土栽培系统（A new type of liquid storage and gas storage soilless cultivation system）.doc

新型储液储气式无土栽培系统（A new type of liquid storage and gas storage soilless cultivation system） A new type of liquid storage and gas storage soilless cultivation system Bu Chongxing, 1, 2, Zhang Yanling 2, Huang Danfeng 1, Li Shijun 3, Yao Yongkang 2 (1. 、 Shanghai Jiao Tong University, 2. 、 sun bridge laboratory, Shanghai Key Laboratory of Facility Horticulture Technology, Nanjing Agricultural University, 3..) Fund Project: Shanghai science and technology key project (Shanghai agricultural school word (2003) No. 9-2) The original was published in Journal of Huazhong Agricultural University Abstract: a new soilless culture device for fruit and vegetable was developed. It has a barrel, assembled in a core network, the device is divided into matrix, space and nutrition of three parts. The device is well regulated in the unit solid, gas and liquid phase equilibrium, solve the contradiction between the rhizosphere in soilless culture for the liquid and oxygen supply, nutrient liquid layer and the bottom of the device in a certain period of time the plant continued to supply sufficient water and nutrition, so that plants can grow strong, is a kind of new the new soilless culture system. From the demonstration production in Shanghai, Sun Bridge, Xinjiang and Yinchuan, the device has the characteristics of easy moving, convenient early planting, saving matrix and nutrient solution, and obviously increasing production. Key words: soilless culture; soilless cultivation device; soilless cultivation system Many forms of soilless culture, organic ecotype soilless culture and Lu SC type soilless culture, nutrient film technology (NFT), deep flow (DFT) system, floating capillary (FCH) system and other soilless culture system [1]. But in our country, except for organic ecotype soilless culture and matrix trough cultivation, the scale of other systems is still small. The main factors are high investment, imperfect facilities, poor system operation and difficult treatment of substrate after