Preparation of films by magnetron sputtering利用磁控溅射制备薄膜的研究.pdfVIP

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Preparation of films by magnetron sputtering利用磁控溅射制备薄膜的研究.pdf

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20 Cu Ti Cu-Zr Cu Ti XRD Cu-Zr I Abstract Thin film technology and film material have developed rapidly in the past 20 years. New type of thin film materials emerge in a large amount. Film preparation and microfabrication technology innovate continuously, thin films application in the high-tech are increasingly popularity. Because of thin film technology could achieve the device miniaturized and system integration, thin film technology and thin film materials have been widespread concern. The technology of Vacuum Magnetron Sputtering Deposition is wide used on the field of thin film manufacture. Appropriate technics and manufacture technique have important influence to the quality of film. Using magnetron sputtering technology, explore different experimental conditions to preparate metal film. On the basis of previous studies, introduces the magnetron sputtering coating principle and magnetron sputtering experimental process. Technique preparation Cu-film, Ti-film and Cu-Zr metal thin-film, by using of magnetron sputtering, and analyzes of Cu-film, Ti-film optical properties. Analysis of amorphous of Cu-Zr thin films alloys structure by XRD diffraction experiment. Key Words Magnetron sputtering; Thin film technology; Film materials; Metal thin film; Reflectivity