IC Metrology 量测.pdfVIP

IC Metrology (量測) Reference: Michael Quirk and Julian Serda, “Semiconductor Manufacturing Technology”, Prentice-Hall, Inc., New Jersey, 2001. Resistance measurement A known value of current (I) is passed between the two outer probes and potential difference (V) developed across the two inner probes is measured. This approach avoids dealing with the 第一支與第四支探針用來測量晶元的電阻，第二支與第三 effect of contact resistance. 支探針用來測量晶元電壓。 Film thickness and