电子束蒸发镀铬制备凹印版材耐磨层的研究-LPPM-北京印刷学院.PDFVIP

第 34 卷 　第 2 期 表 　面 　技 　术 Vol. 34 　NO. 2 　2005 年 4 月 SURFACE TECHNOLOGY Apr. 2005 　 电子束蒸发镀铬制备凹印版材耐磨层的研究 张跃飞 ,张广秋 ,王正铎 ,葛袁静 ,陈 　强 (北京印刷学院 等离子体物理及材料研究室 ,北京 102600) 　　[摘 　要] 　利用电子束蒸发镀技术在铜表面沉积铬层 ,并对制备的工艺 ,涂层的性能行了初步研究。结果显示 ,采用 ( ) ( ) ) 低电压 6kV 和低束流 50mA 、60mA 蒸镀时 ,沉积速度适中 ,所得的膜层呈银白色且光亮 , 内应力较小,无开裂现象 ,镀层 厚度均匀 ,硬度较高 ,且与基体结合良好。适当控制电子枪的工艺参数和烘烤时间可以增加薄膜与基体的结合力。 [ 关键词] 　电子束蒸发镀;凹印;粗糙度 ;结合力 ( ) [ 中图分类号]TG166. 5 　 　 　 [文献标识码]A 　 　 　 [文章编号]1001 - 3660 2005 02 - 0027 - 03 Preparation of Wearable Layer of Gravure Printing by Electron Beam Evaporation Deposition ZHANG Yuefei , ZHANG Guangqiu , WANG Zhengduo , GE Yuanjing , CHEN Qiang (Laboratory of Plasma Physics and Materials , Beijing Institute of Graphic Communication , Beijing 102600 , China) [Abstract ] The hard Cr films are deposited on Cu surface by means of electron beam evaporation deposition technique as a wear resistance layer of gravure printing. The preparation processing and the films properties are ana lyzed. The experiment results show that films have high microhardness and the adhesion is good by the evaporation processing of low voltage (6kV) and low beam electric current (5060mA) . The adhesion between film and substrate is improved by adjusting the processing parameter of electron beam and increasing the heating time. [ Key words ] Electron beam evaporation deposition ; Gravure printing ; Roughness ; Adhesion 0 　引