半导体制程浓度屈折度计PR.pdfVIP

CONCENTRATION MONITORING OF FAB CHEMICALS IN CLEANROOM ENVIRONMENTS 無塵室環境之 FAB 化學液濃度監控 半導體製程濃度屈折度計 PR-33-S APPLICATIONS 應用 K-Patents 半導體屈折度計 PR-33-S 即時監控化學 k-Patents Semicon Process Refractometer PR-33-S 液中的濃度於無塵室及 fab 製程及整合製程機台 monitors real-time the consistency of liquid chemical concentrations in the ultra-clean semiconductor 中。典型的 K-Patents PR-33-S 應用類型包括: fabrication processes and integrated process tools. Typical uses of k-Patents PR-33-S include: ■ 避免錯誤的化學液或錯誤的濃度進入製程機台 或 wet bench ，以及避免昂貴的設備及晶圓毀 • Preventing wrong chemicals or wrong concentrations from entering the process tool 損。 or the wet bench and thus helping to prevent expensive equipment damage and wafer ■ 協助蝕刻製程的最佳化，以及增加槽體中蝕刻 scrap. 液的使用壽命。 • Assisting in optimizing etch process and in ■ 增加晶圓產出率至最高 20%以及減少蝕刻後 increasing the bath life of the etch solution. 去除聚合物清潔化學液(例如 EKC-265)的消耗 量。 • Increasing wafer throughput typically by up to 20%, and reducing cleaning chemical ■ 幫助達成 CMP slurries 的緊密控制以及使拋 (e.g. EkC-265) consumption in the post etch 光製程一致化。 polymer removal. • Helping to achieve tight control of CMP slurries an 可被監控的化學液種類 MONITORED Acetic acid CH COOH, Acetone CH COCH , 3 3 3 Ammonia NH OH, Ammonium fluoride NH F, 4 4 CHEMICALS Ammonium hydroxide NH4 OH, Ammonium sulphate(NH ) SO , Citric acid C H O , 4 2 4 6 8 7 Chromic acid CrO3 , Dilute Hydrofluoric acid Acetic acid CH COOH, Acetone CH COCH , 3 3 3 DHF, Ferric chloride FeCl2 , Formic acid Ammonia NH OH, Ammonium flu oride NH F,