PLD-Ⅲ型脉冲激光溅射沉积设备(PPT-42).ppt

Interaction between laser and materials (part II) Study on the properties of plasmas produced by pulsed laser ablation of solid materials Pulsed Laser Deposition (PLD) Surface modification of polymer by a pulsed laser Interaction of laser and atome, molecule The interaction of a laser pulse with clusters. Pulsed Laser Deposition (PLD) Set up of PLD The Plume Bane of PLD Conclusions Set Up for PLD PLD-Ⅲ型脉冲激光溅射沉积设备 Composition of Plume Contains “atoms, molecules, electrons, ions, clusters, micron-sized solid particulates, and molten globules” Larger particles cause defects Evaporative materials highly energetic. Increases adatom mobility Plume Behavioral Characteristics Extremely dense. Very short collisional mean free paths Rapidly expands. Exhibits hydrodynamical flow. Highly directional. Deposition is suitable to small area. The Bane of PLD -----deposition of micron-sized particulates Mechanisms Subsurface Boiling Pressure Expulsion Exfoliation Improvement techniques Lower Laser Power Density Mechanical Particle Filter Plume Manipulation Smoothing Target Surface Subsurface Boiling Laser superheats subsurface layer before surface reaches evaporation point Surface breaks apart into large (micron-sized) globule particles when the subsurface expands. Pressure Expulsion Expansion of plume causes sudden drop in pressure just above surface Shock wave pulls droplets of liquid off of surface Exfoliation Thermal shock causes irregularities in surface to break off Surface morphology Previous ablation Particulates are randomly shaped Conclusions Almost any material Laser outside chamber. Can vary modes Plume at high energy Disadvantages Advantages Deposition of micron-sized particulates Plume highly directional Uniform only over a small area SEM pictures showing the surface morphology of (a) 100 ℃, (b) 200 ℃, (c) 300 ℃, (d) 400 ℃, (e) 500 ℃ on Si(111) at 200 mJ (b) (a) (c) (d) (e) SEM observation for ZnO film SEM of ZnO thin films on Si(111) grown at differen