(英文)无掩膜光刻的模式生成系统.docVIP

  • 7
  • 0
  • 约1.8万字
  • 约 14页
  • 2018-07-08 发布于江西
  • 举报
(英文)无掩膜光刻的模式生成系统.doc

------------------------------------------------------------------------------------------------ —————————————————————————————————————— (英文)无掩膜光刻的模式生成系统 ICCAS2005 June 2-5, KINTEX, Gyeonggi-Do, Korea Region-based Pattern Generating System for Maskless Photolithography Younghun Jin*, Kiwon Park*, Jaeman Choi*, Sangjin Kim**, Changgeun An**, and Manseung Seo* * Dept. of Computer-Aided Mechanical Design Eng., Tongmyong Univ. of I.T., Busan, Korea (Tel : +82-51-610-8351; E-mail: sms@tit.ac.kr) **Thinfilm Technology Group, LG PRC, LG E

文档评论(0)

1亿VIP精品文档

相关文档