氯化铯自组装制备高深宽比硅纳米针尖阵列 干法刻蚀.pdfVIP

Fabrication of silicon nanotip arrays with high aspect ratio by cesium chloride self- assembly and dry etching Xinshuai Zhang, Jing Liu, Bo Wang, Tianchong Zhang, and Futing Yi Citation: AIP Advances 4, 031335 (2014); doi: 10.1063/1.4869238 View online: /10.1063/1.4869238 View Table of Contents: /toc/adv/4/3 Published by the American Institute of Physics Articles you may be interested in The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching Journal of Applied Physics 116, 173503 (2014); 10.1063/1.4900996 Improvement of light extrac