纳米材料和纳米结构第09讲-纳米图案化技术.pptVIP

纳米结构和纳米材料; 1 Introduction Enormous Achievement Obtained by Microelectronics(微电子取得了巨大的成就);Similar to traditional optical lithography, nanolithography also consists of three parts: （与传统光学印刷术相同的是：纳米光刻也包括3部分）;?;In EBL nanofabrication, working conditions at which electron scattering;2-1-1EBLMachine;Three essential parts of an EBL equipment: an electron gun, a vacuum system, and a control system（电子刻蚀仪的3个重要组成：电子枪，真空系统、控制系统）;2-1-2 E-beam Resists（电子束反蚀剂）;电子束反蚀剂;A necessary process to transfer the EBL-made pattern from the resist;图案转移过程;TheLift-offprocessflow;AnundercutprofileinPMMAresist;