光学元件表面真空等离子体处理与工艺研究光学工程专业论文.docxVIP

Research Research on Vacuum Plasma Processing for Optical Surface Discipline：Optical Engineering Student Signature： 西％伊丫 Supervisor Signature： 山协W广俨 才吼。蹦～ Abstract Compared with traditional polishing methods，the plasma polishing technology has advantage of processing effect，and has been widely applied in the field of microelectronics and optical manufacturing．According to the current specific practical problems in the optical element,vacuum plasma technology is applied to the manufacturing ofUltra-smooth Surface．It Can rapidly remove the cutter mark of the formation in precision CNC grinding process and remove effectively the surface defects and sub-surface damage of the optical material，and reduce the optical losses of optical element by the plasma active radicals and ions of the chemical reaction． Based on the existing polishing experiment facility,capacitive coupled plasma source of RF discharge method Was designed．The plasma source could realize discharge．Langmuir probe was applied to diagnose plasma characteristics．The influence of processing parameters (RF power,working pressure，the gas flow rate of the Argon，the gas flow rate of the Oxygen and the gas flow rate of the CFO on surface roughness and etching rate were studied by the technology of capacitive coupled plasma and inductively coupled plasma．Finally,the chemical removal mechanism ofthe vacuum plasma on the surface ofquartz is preliminarily discussed． The research suggests that the optimal parameters in the ICP-98A process experiment are RF power of 180w，Argon flow rate of 70seem，Oxygen flow rate of 10seem，CF4 flow rate of 30 seem and working pressure of 2Pa and etching time of one hour on quartz surface．By RF bias，surface roughness of quartz is improved and reduced to 1．1 9nm on these parameters．Also， maximum etching rate of 1 53．33nm／h has been recorded．Compared wiⅡl the physical sputtering plasma etch rates is obviously improved．The profile accuracy of quartz surface is improved by O．32X to 0．08X