先进表面工程技术.ppt

\ Development of Plasma-based Ion Implantation Techniques in China Plasma based ion implantation in China Harbin / R2 Beijing / R2 Dalian / R1 Shanghai / R3 Chengdu / R2 Shenzhen / C1 Hongkong / R1 7 Cities / 12 Groups R― Research C― Company Typical Facilities Plasma Source Schematic diagram of the microwave ECR PBII apparatus Schematic diagram of the RF and filaments PBII apparatus Plasma Density Plasma Density Gaseous elements implanted by PBII The TEM of AlN precipitates of 2014 aluminum alloys sample implanted with nitrogen Variation in relative wear resistance with nitrogen ions dose The depth profile of nitrogen in the ion implanted layer Gaseous elements implanted by PBII The nitrogen concentration, surface hardness and wear resistance of Ti6Al4V implanted with nitrogen by PBII 60kV, 120min 60kV, 90min 30kV, 90min 0.03m/s 0.06m/s Inner surface implantation With anode Without anode Metal plasma-based ion implantation (MePBII) The schematic drawing of UBM MePBII The profiles of Cu in surface layer Metal plasma-based ion implantation (MePBII) Oscilloscope traces of (a) arc current, and (b) implantation voltage pulse and implantation current during MePBII The schematic drawing of MEVVA MePBII Metal plasma-based ion implantation (MePBII) Coefficient of friction curves of the 9Cr18 samples AES depth profile of 9Cr18 implanted with Ti and N Plasma-based Ion Implantation and Deposition (PBIID) Elements concentration distribution in the mixed layer measured by XPS 激光表面加热技术的应用 4.离子注入表面改性技术 离子注入原理 Workpiece Ion Source Ion Beam Extraction Ion Beam Assembleand Scanning Installation Orientating Beam Working Table Elevated Chamber Schematic drawing of the beam ion implantation process 注入离子的能量损失 射程分布 表面溅射 辐照损伤 辐照损伤 离子注入模型 离子注入表面改性机理 辐照损伤，形成大量缺陷 弥散强化，形成化合物质点 喷丸作用，离子轰击 表面压缩，单位体积内原子数目增加 表面形成非晶态 降低摩擦系数 提高表面强度，提高耐磨性 提高疲劳性能 提高表面耐腐蚀性 等离子体基离子注入 Plasma incidence Positive ions High Voltage Modulator ＋ －＝ Workpiece Working Table Insulation supporterand high Volta